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 항목소개 |
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| Plasma etching, a purely chemical dry etching technique, basically consists of the following steps: 1) generation of reactive species in a plasma; 2) diffusion of these species to the surface of the material being etched; 3) adsorption of these species on the surface; 4) occurrence of chemical reactions between the species and the material being etched, forming volatile byproducts; 5) desorption of the byproducts from the surface; and 6) diffusion of the desorbed byproducts into the bulk of the gas. |
| 회사소개 |
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| Suzhou CSE Semiconductor Equipment Technology Co.,Ltd is a leading manufacturer of wet processing systems and distribution & service solutions provider serving the semiconductor,solar cell,photovoltaic and LCD manufacturing industries in China.
Our main businesses include manufacturing wet processing systems of semiconductor,solar photovoltaic and LCD industries and providing OEM service for its overseas suppliers, representing and distribution related semiconductor,solar cell and LCD producing equipments including front-end and back-end.
We provide innovative, professional wet cleaning solutions for semiconductor,solar cell and LCD manufacturers. Our customers include topping IC fabs, crystalline & polycrystalline silicon manufactures,electronic components suppliers,solar cell companies and LCD producers.
Our key competitive strengths lie in our innovation, strong customer focus, strong partnership with customers and completely service support network.
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| 연락처 |
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| 주소: |
398 RuoShui Road, Industrial Park,suzhou |
| 전화 : |
+86-512-62872542 |
| 팩스 : |
+86-512-62872543 |
| 담당자
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Amy Chang |
| E-MAIL: |
amychangcse@yahoo.com |
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